Phosphorus doping of 4H SiC by liquid immersion excimer laser irradiation

Phosphorus doping of 4H SiC is performed by KrF excimer laser irradiation of 4H SiC immersed in phosphoric acid. Phosphorus is incorporated to a depth of a few tens of nanometers at a concentration of over 1020/cm3 without generating significant crystal defects. Formation of a pn junction diode with an ideality factor of 1.06 is demonstrated.