Effects of Residence Time and Reaction Conditions on the Deposition of SiC from Methyltrichlorosilane and Hydrogen

Authors :: Chunnian Zhao
Litong Zhang
Cuiying Lu
Laifei Cheng
Fang Ye
Source :: International Journal of Applied Ceramic Technology. 9:642-649
Publication Year :: 2012
Publisher :: Wiley, 2012.
Abstract: The overall growth kinetics of silicon carbide films deposited from the mixture of methyltrichlorosilane (MTS) and hydrogen were determined by a magnetic suspension microbalance. The results show that three regions are distinguishable in the studied temperature range. In low temperatures (

Subjects :: Marketing
Reaction mechanism
Materials science
Hydrogen
Inorganic chemistry
Analytical chemistry
chemistry.chemical_element
Activation energy
Chemical vapor deposition
Atmospheric temperature range
Condensed Matter Physics
Methyltrichlorosilane
chemistry.chemical_compound
chemistry
Materials Chemistry
Ceramics and Composites
Reactivity (chemistry)
Deposition (chemistry)

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