In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu2O3

MLA

J. More-Chevalier, et al. “In-Situ Plasma Monitoring by Optical Emission Spectroscopy during Pulsed Laser Deposition of Doped Lu2O3.” Applied Physics B, vol. 127, Sept. 2021. EBSCOhost, https://doi.org/10.1007/s00340-021-07689-4.

APA

J. More-Chevalier, S. Irimiciuc, K. Kůsová, Tomáš Zikmund, Morgane Poupon, Ladislav Fekete, Ján Lančok, Michal Novotný, Š. Havlová, & S. Chertpalov. (2021). In-situ plasma monitoring by optical emission spectroscopy during pulsed laser deposition of doped Lu2O3. Applied Physics B, 127. https://doi.org/10.1007/s00340-021-07689-4

Chicago

J. More-Chevalier, S. Irimiciuc, K. Kůsová, Tomáš Zikmund, Morgane Poupon, Ladislav Fekete, Ján Lančok, Michal Novotný, Š. Havlová, and S. Chertpalov. 2021. “In-Situ Plasma Monitoring by Optical Emission Spectroscopy during Pulsed Laser Deposition of Doped Lu2O3.” Applied Physics B 127 (September). doi:10.1007/s00340-021-07689-4.