Defect structure of 4H silicon carbide ingots

Defects caused by 15R polytype inclusions in 4H silicon carbide ingots have been considered. Growth rate along with curvature of the interface determines the stability of the 4H-polytype reproduction. The domain structure arising in the 4H polytype as a result of foreign polytype inclusion has been analyzed. Antiphase domains of the 4H polytype emerging at the top and lateral sides of 15R inclusion form a strictly determined set of binary and ternary joints (extended threading defects). Junctions of a higher order could generate open-core threading superdefects.