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Effect of ethylenediamine on CMP performance of ruthenium in H2O2-based slurries
- Source :
- RSC Advances. 12:228-240
- Publication Year :
- 2022
- Publisher :
- Royal Society of Chemistry (RSC), 2022.
-
Abstract
- In the ruthenium CMP process, the removal rate of ruthenium can be effectively improved by adding EDA and H2O2into SiO2-based slurries.
- Subjects :
- General Chemical Engineering
General Chemistry
Subjects
Details
- ISSN :
- 20462069
- Volume :
- 12
- Database :
- OpenAIRE
- Journal :
- RSC Advances
- Accession number :
- edsair.doi...........5a2b78edc21e1dfe725c2b400f2a3a9b