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Effect of ethylenediamine on CMP performance of ruthenium in H2O2-based slurries

Authors :
Yi Xu
Tengda Ma
Yuling Liu
Baimei Tan
Shihao Zhang
Yazhen Wang
Guoqiang Song
Source :
RSC Advances. 12:228-240
Publication Year :
2022
Publisher :
Royal Society of Chemistry (RSC), 2022.

Abstract

In the ruthenium CMP process, the removal rate of ruthenium can be effectively improved by adding EDA and H2O2into SiO2-based slurries.

Details

ISSN :
20462069
Volume :
12
Database :
OpenAIRE
Journal :
RSC Advances
Accession number :
edsair.doi...........5a2b78edc21e1dfe725c2b400f2a3a9b