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In-line channel power monitor based on helium ion implantation in silicon-on-insulator waveguides
- Source :
- IEEE Photonics Technology Letters. 18:1882-1884
- Publication Year :
- 2006
- Publisher :
- Institute of Electrical and Electronics Engineers (IEEE), 2006.
-
Abstract
- We propose and demonstrate an in-line channel power monitor (ICPM) based on helium ion implanted silicon waveguides. The implanted waveguide can detect light at below-bandgap wavelengths (1440-1590 nm) which are normally not detectable by silicon. We study the enhanced photoresponse of helium ion implanted samples which were annealed at 200 degC, 300 degC, or 350 degC for different durations. Optical absorption and photodetector current measurements were performed for each sample. The ICPM can provide the same function as a waveguide tap coupler and a hybrid-integrated conventional photodiode
- Subjects :
- Materials science
Silicon
business.industry
Photodetector
chemistry.chemical_element
Silicon on insulator
Waveguide (optics)
Atomic and Molecular Physics, and Optics
Electronic, Optical and Magnetic Materials
Photodiode
law.invention
Ion
Ion implantation
chemistry
law
Optoelectronics
Electrical and Electronic Engineering
business
Helium
Subjects
Details
- ISSN :
- 10411135
- Volume :
- 18
- Database :
- OpenAIRE
- Journal :
- IEEE Photonics Technology Letters
- Accession number :
- edsair.doi...........59ce2d7309440144a791afe86ce6f0ba