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Interfacial effect on thermal conductivity of Y2O3 thin films deposited on Al2O3

Authors :
S.R. Kim
Kyung Chun Kim
G.H. Park
Kwangseuk Kyhm
Chung-Sik Kim
Kyong-Soo Hong
Jong-Ryul Kim
Ho-Soon Yang
Source :
Thermochimica Acta. 455:50-54
Publication Year :
2007
Publisher :
Elsevier BV, 2007.

Abstract

The interfacial effect on thermal conductivity is studied with Y 2 O 3 thin films deposited on an Al 2 O 3 substrate. Y 2 O 3 thin films with the thickness between 100 and 500 nm are prepared using rf magnetron sputtering and thermal conductivity of the films is measured using the 3 ω method. The strong film thickness-dependent thermal conductivity due to the interfacial thermal resistance is observed. The film thickness-dependent thermal conductivity is explained by an interface thermal resistance between the film and substrate.

Details

ISSN :
00406031
Volume :
455
Database :
OpenAIRE
Journal :
Thermochimica Acta
Accession number :
edsair.doi...........594be53ea3ce9f9955a06da00323ff57