Back to Search
Start Over
Contact resistance and stability study for Au, Ti, Hf and Ni contacts on thin-film Mg 2 Si
- Source :
- Journal of Alloys and Compounds. 699:1134-1139
- Publication Year :
- 2017
- Publisher :
- Elsevier BV, 2017.
-
Abstract
- We present a detailed study of post-deposition annealing effects on contact resistance of Au, Ti, Hf and Ni electrodes on Mg 2 Si thin films. Thin-film Mg 2 Si and metal contacts were deposited using magnetron sputtering. Various post-annealing temperatures were studied to determine the thermal stability of each contact metal. The specific contact resistivity (SCR) was determined using the Cross Bridge Kelvin Resistor (CBKR) method. Ni contacts exhibit the best thermal stability, maintaining stability up to 400 °C, with a SCR of approximately 10 −2 Ω-cm 2 after annealing. The increased SCR after high temperature annealing is correlated with the formation of a Mg-Si-Ni mixture identified by cross-sectional scanning transmission electron microscopy (STEM) characterization, X-ray diffraction characterization (XRD) and other elemental analyses. The formation of this Mg-Si-Ni mixture is attributed to Ni diffusion and its reaction with the Mg 2 Si film.
- Subjects :
- 010302 applied physics
Materials science
Annealing (metallurgy)
Mechanical Engineering
Contact resistance
Metals and Alloys
Analytical chemistry
Nanotechnology
02 engineering and technology
Sputter deposition
021001 nanoscience & nanotechnology
01 natural sciences
Mechanics of Materials
Electrical resistivity and conductivity
0103 physical sciences
Scanning transmission electron microscopy
Electrode
Materials Chemistry
Thermal stability
Thin film
0210 nano-technology
Subjects
Details
- ISSN :
- 09258388
- Volume :
- 699
- Database :
- OpenAIRE
- Journal :
- Journal of Alloys and Compounds
- Accession number :
- edsair.doi...........58d1a3f0ac314f2b3e92953e133eab9c