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The preparation of nanosized silicon by laser-induced chemical vapour deposition
- Source :
- Thin Solid Films. 368:315-318
- Publication Year :
- 2000
- Publisher :
- Elsevier BV, 2000.
-
Abstract
- The effect of preparation parameters on the particle size of silicon nanocrystallite produced by laser-induced chemical vapour deposition (LICVD) was studied. It is found that the particle size of nano-Si prepared by LICVD is related to preparation parameters. We obtained the optimum synthesis parameters for preparation of the right sized nano-Si powder produced by LICVD. The effect of different annealing treatments on the infrared (IR) absorption bands of the nanosized silicon was also investigated.
- Subjects :
- Materials science
Absorption spectroscopy
Silicon
Annealing (metallurgy)
technology, industry, and agriculture
Metals and Alloys
Infrared spectroscopy
chemistry.chemical_element
Mineralogy
Surfaces and Interfaces
Chemical vapor deposition
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Chemical engineering
chemistry
Nanocrystal
Materials Chemistry
Particle size
Crystallite
Subjects
Details
- ISSN :
- 00406090
- Volume :
- 368
- Database :
- OpenAIRE
- Journal :
- Thin Solid Films
- Accession number :
- edsair.doi...........586f69df381bea412956df07f581b8b1