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The preparation of nanosized silicon by laser-induced chemical vapour deposition

Authors :
Aixiang Wei
Ke-Xin Chen
Weixiang Wang
Haiyan Zhang
Lizheng Liang
Songhao Liu
Dihu Chen
Source :
Thin Solid Films. 368:315-318
Publication Year :
2000
Publisher :
Elsevier BV, 2000.

Abstract

The effect of preparation parameters on the particle size of silicon nanocrystallite produced by laser-induced chemical vapour deposition (LICVD) was studied. It is found that the particle size of nano-Si prepared by LICVD is related to preparation parameters. We obtained the optimum synthesis parameters for preparation of the right sized nano-Si powder produced by LICVD. The effect of different annealing treatments on the infrared (IR) absorption bands of the nanosized silicon was also investigated.

Details

ISSN :
00406090
Volume :
368
Database :
OpenAIRE
Journal :
Thin Solid Films
Accession number :
edsair.doi...........586f69df381bea412956df07f581b8b1