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Warpage reduction using dielectric layers stress tuning: From analytical model to 3D integration of large die on ceramic substrate

Authors :
G. Imbert
Laetitia Castagne
Gilles Simon
F. Casset
Pascal Chevalier
N. Chevrier
B. Kholti
L. Toffanin
Sébastien Petitdidier
F. Bailly
Jp. Pierrel
D. Mermin
R. Franiatte
C. Ferrandon
Source :
2016 6th Electronic System-Integration Technology Conference (ESTC).
Publication Year :
2016
Publisher :
IEEE, 2016.

Abstract

A mechanical study of silicon interposer bow reduction, from wafer level manufacturing to large die stacking including analytical modeling, is presented in this paper. Indeed, understanding and reducing the warpage of a dissymmetrical substrate is fundamental for assembly yield and interconnects reliability. The target here is a bow less than 50 µm for a 650 mm2 Si-interposer.

Details

Database :
OpenAIRE
Journal :
2016 6th Electronic System-Integration Technology Conference (ESTC)
Accession number :
edsair.doi...........5850f68bc6ecd5229641ea5556d1a7a1
Full Text :
https://doi.org/10.1109/estc.2016.7764485