Back to Search
Start Over
Formation of atomic-scale germanium quantum dots by selective oxidation of SiGe/Si-on-insulator
- Source :
- Applied Physics Letters. 83:4628-4630
- Publication Year :
- 2003
- Publisher :
- AIP Publishing, 2003.
-
Abstract
- A complementary metal-oxide-semiconductor-compatible method is proposed to form atomic-scale germanium (Ge) quantum dots (
- Subjects :
- Thermal oxidation
Materials science
Physics and Astronomy (miscellaneous)
Condensed matter physics
business.industry
Economies of agglomeration
chemistry.chemical_element
Silicon on insulator
Germanium
Insulator (electricity)
Condensed Matter::Mesoscopic Systems and Quantum Hall Effect
Atomic units
Condensed Matter::Materials Science
chemistry
Semiconductor quantum dots
Quantum dot
Optoelectronics
business
Subjects
Details
- ISSN :
- 10773118 and 00036951
- Volume :
- 83
- Database :
- OpenAIRE
- Journal :
- Applied Physics Letters
- Accession number :
- edsair.doi...........555b7d38f353ae65d58e043671a603c3
- Full Text :
- https://doi.org/10.1063/1.1631395