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Formation of atomic-scale germanium quantum dots by selective oxidation of SiGe/Si-on-insulator

Authors :
Pei-Wen Li
S. W. Lin
Pang-Shiu Chen
Ming-Jinn Tsai
W. M. Liao
S. C. Lu
Source :
Applied Physics Letters. 83:4628-4630
Publication Year :
2003
Publisher :
AIP Publishing, 2003.

Abstract

A complementary metal-oxide-semiconductor-compatible method is proposed to form atomic-scale germanium (Ge) quantum dots (

Details

ISSN :
10773118 and 00036951
Volume :
83
Database :
OpenAIRE
Journal :
Applied Physics Letters
Accession number :
edsair.doi...........555b7d38f353ae65d58e043671a603c3
Full Text :
https://doi.org/10.1063/1.1631395