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Fabrication of 3D nanoimprint stamps with continuous reliefs using dose-modulated electron beam lithography and thermal reflow
- Source :
- Journal of Micromechanics and Microengineering. 20:095002
- Publication Year :
- 2010
- Publisher :
- IOP Publishing, 2010.
-
Abstract
- 3D electron beam lithography and thermal reflow were combined to fabricate structures with multilevel and continuous profiles. New shapes, smooth surfaces and sharp corners were achieved. By using exposure with variable doses, up to 20 steps were fabricated in a 500 nm thick resist with a lateral resolution of 200 nm. Steps were reflowed into continuous slopes by thermal post-processing, and were transferred into silicon substrates by proportional plasma etching. The method can be used for the fabrication of 3D nanoimprint stamps with both sharp features and continuous profiles.
- Subjects :
- Materials science
Fabrication
Plasma etching
Silicon
business.industry
Mechanical Engineering
chemistry.chemical_element
Lateral resolution
Electronic, Optical and Magnetic Materials
Optics
Resist
chemistry
Mechanics of Materials
Thermal
Dry etching
Electrical and Electronic Engineering
business
Electron-beam lithography
Subjects
Details
- ISSN :
- 13616439 and 09601317
- Volume :
- 20
- Database :
- OpenAIRE
- Journal :
- Journal of Micromechanics and Microengineering
- Accession number :
- edsair.doi...........55439d1d81a714682809d198858b4c4b