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Detailed analysis of high-quality symmetrical octagonal spiral inductors on Si substrate

Authors :
Dao-Xian Xu
Ban-Leong Ooi
Source :
International Journal of RF and Microwave Computer-Aided Engineering. 15:181-186
Publication Year :
2005
Publisher :
Hindawi Limited, 2005.

Abstract

Research studies of symmetrical spiral inductors for silicon technology have become very important and challenging. In this article, we attempt to give a detailed explanation of how symmetrical spiral inductors help to improve the quality factor (Q) as compared to conventional nonsymmetrical inductors. The experimental results are presented to verify our theory. © 2005 Wiley Periodicals, Inc. Int J RF and Microwave CAE, 2005.

Details

ISSN :
1099047X and 10964290
Volume :
15
Database :
OpenAIRE
Journal :
International Journal of RF and Microwave Computer-Aided Engineering
Accession number :
edsair.doi...........54e92139c561d7e573b2b84f8668579f
Full Text :
https://doi.org/10.1002/mmce.20066