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Proton nmr studies of annealed plasma-deposited amorphous Si:H films

Authors :
Jeffrey A. Reimer
Robert W. Vaughan
John C. Knights
Source :
Solid State Communications. 37:161-164
Publication Year :
1981
Publisher :
Elsevier BV, 1981.

Abstract

Proton magnetic resonance data are presented for plasma-deposited amorphous Si:H as a function of annealing temperature up to 650°C. The data indicate that hydrogen diffuses internally before major evolution occurs, that transfer of hydrogen occurs from a heavily clustered phase to a dilute phase coincident with evolution and that evolution occurs initially from the heavily clustered phase. Comparison with infrared data indicates that the heavily clustered phase can be either SiH x ( x = 2,3) or SiH.

Details

ISSN :
00381098
Volume :
37
Database :
OpenAIRE
Journal :
Solid State Communications
Accession number :
edsair.doi...........5482afb5ea4fda5f18034fc40ce28703
Full Text :
https://doi.org/10.1016/0038-1098(81)90734-1