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Monitoring VLSIC fabrication processes: a Bayesian approach

Authors :
J. Lehoczky
Andrzej J. Strojwas
S. Rao
M. Schervish
Source :
Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop.
Publication Year :
2002
Publisher :
IEEE, 2002.

Abstract

We have developed a process monitoring system, in a Bayesian framework, which is designed to be used for monitoring VLSIC and other multi-stage manufacturing processes. For a single step process, the Bayesian monitor is at least as good as the Shewhart-CUSUM combination charts for detecting changes in the distribution of the in-lines collected from the step. For a multi-stage process, however, the Bayesian monitor can significantly reduce the detection time by using in-line correlation information from earlier stages.

Details

Database :
OpenAIRE
Journal :
Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop
Accession number :
edsair.doi...........5308f0ae331db9a4038186b161202a18
Full Text :
https://doi.org/10.1109/asmc.1995.484375