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Monitoring VLSIC fabrication processes: a Bayesian approach
- Source :
- Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop.
- Publication Year :
- 2002
- Publisher :
- IEEE, 2002.
-
Abstract
- We have developed a process monitoring system, in a Bayesian framework, which is designed to be used for monitoring VLSIC and other multi-stage manufacturing processes. For a single step process, the Bayesian monitor is at least as good as the Shewhart-CUSUM combination charts for detecting changes in the distribution of the in-lines collected from the step. For a multi-stage process, however, the Bayesian monitor can significantly reduce the detection time by using in-line correlation information from earlier stages.
Details
- Database :
- OpenAIRE
- Journal :
- Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop
- Accession number :
- edsair.doi...........5308f0ae331db9a4038186b161202a18
- Full Text :
- https://doi.org/10.1109/asmc.1995.484375