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Optimization of illumination pupils and mask structures for proximity printing
- Source :
- Microelectronic Engineering. 87:1164-1167
- Publication Year :
- 2010
- Publisher :
- Elsevier BV, 2010.
-
Abstract
- Based on numerical simulations, we show the influence of the illumination on process windows in mask aligner lithography. The precise shaping of the illuminating light can lead to greatly increased process windows. We show that the best results are obtained when combining an optimized illumination with optimized mask structures and Optical Proximity Correction (OPC). We model the illumination according to the novel illumination system for SUSS MicroTec mask aligners, referred to as MO Exposure Optics, which allows a precise shaping of the angular spectrum and the partial coherence of the mask illuminating light by using Illumination Filter Plates (IFPs).
- Subjects :
- Materials science
business.industry
Process (computing)
Condensed Matter Physics
Atomic and Molecular Physics, and Optics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Critical illumination
law.invention
Angular spectrum method
Optics
Optical proximity correction
law
Filter (video)
Köhler illumination
Electrical and Electronic Engineering
Photolithography
business
Lithography
Subjects
Details
- ISSN :
- 01679317
- Volume :
- 87
- Database :
- OpenAIRE
- Journal :
- Microelectronic Engineering
- Accession number :
- edsair.doi...........524e4242e19ec03f1cd7268633db90f5