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A novel approach for the fabrication of low-stress bimorph RF-MEMS switches
- Source :
- Multidiscipline Modeling in Materials and Structures. 13:116-121
- Publication Year :
- 2017
- Publisher :
- Emerald, 2017.
-
Abstract
- Purpose The purpose of this paper is to design a low-cost stress bimorph RF-MEMS switch which is the desired transmission area application. Design/methodology/approach The bimorph structure of the low-temperature plasma-enhanced chemical vapor deposition (PECVD) of thermal oxide and gold are utilized to create the vibrating membrane. The effects of process conditions of low-temperature oxide deposited using the PECVD technique enable stress-free deposition of the key structural layer. Findings Scanning electron microscope images of the RF micro-switch confirms negligible stress in the released structure. The RF performances of this device exhibit isolation around 43 dB of up to 50 GHz in the OFF-state position and an insertion loss of less than 0.18 dB in the ON-state. Originality/value The finite element method results show good isolation of 43 dB and less insertion loss of 0.18 dB.
- Subjects :
- Microelectromechanical systems
Fabrication
Materials science
business.industry
Mechanical Engineering
Bimorph
020206 networking & telecommunications
02 engineering and technology
Chemical vapor deposition
021001 nanoscience & nanotechnology
Stress (mechanics)
Mechanics of Materials
Residual stress
Plasma-enhanced chemical vapor deposition
Modeling and Simulation
0202 electrical engineering, electronic engineering, information engineering
Electronic engineering
Optoelectronics
Insertion loss
General Materials Science
0210 nano-technology
business
Subjects
Details
- ISSN :
- 15736105
- Volume :
- 13
- Database :
- OpenAIRE
- Journal :
- Multidiscipline Modeling in Materials and Structures
- Accession number :
- edsair.doi...........51f29acdef552a01f4d57d6a29c00f46