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Development of a standalone zoneplate based EUV mask defect review tool

Authors :
Chami Perera
Gi Sung Yoon
Ryan Carlson
Baorui Yang
Mike Hermes
Dave Houser
Alexander Khodarev
Chuck Murray
Travis Grodt
Arnaud Allézy
Weilun Chao
Farhad Salmassi
Eric Gullikson
Patrick Naulleau
Source :
Optical and EUV Nanolithography XXXV.
Publication Year :
2022
Publisher :
SPIE, 2022.

Details

Database :
OpenAIRE
Journal :
Optical and EUV Nanolithography XXXV
Accession number :
edsair.doi...........51e781ab0af512ee832d338b4addb554
Full Text :
https://doi.org/10.1117/12.2617277
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