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Investigation on the pulsed DC plasma nitriding with optical emission spectroscopy

Authors :
Jong U. Kim
Jeon G. Han
Yong M. Kim
Source :
Surface and Coatings Technology. :227-232
Publication Year :
2002
Publisher :
Elsevier BV, 2002.

Abstract

We have investigated nitriding behavior by a pulsed DC plasma nitriding process. For effective control, it is necessary to monitor the density of the active nitrogen species in the plasma, which is responsible for the enhanced plasma–ferro-metal reaction. An optical emission spectroscopy (OES) method was employed for diagnostic analysis of the plasma during the processes. In this study, AISI H13 steels were nitrided at 550 °C for 4 h with various discharge times and nitrogen concentrations. Active species such as N 2 + , N 2 * were evaluated in terms of the first negative system [N 2 + (B 2 Σ u + , ν ′)→N 2 + (X 2 Σ g + , ν″ + hν ], the second positive system [N 2 (C 3 Π u , ν ′)→N 2 (B 3 Π g , ν″ )+ hν ] of nitrogen and Balmer series of hydrogen by OES. In addition, the structures of the samples were analyzed by XRD. It was found that the compound layer consists of the dominant γ′-Fe 4 N phase.

Details

ISSN :
02578972
Database :
OpenAIRE
Journal :
Surface and Coatings Technology
Accession number :
edsair.doi...........51274b33e54f86270df72a076025cf52
Full Text :
https://doi.org/10.1016/s0257-8972(01)01601-2