Pore sealing mechanism in OSG low‐ k films under ion bombardment

Authors :: Ekaterina N. Voronina
Yuri A. Mankelevich
Dmitry Lopaev
A I Zotovich
A. A. Sycheva
A. T. Rakhimov
Olga Proshina
Tatyana Rakhimova
S M Zyryanov
D. G. Voloshin
Source :: Plasma Processes and Polymers. 17:1900165
Publication Year :: 2019
Publisher :: Wiley, 2019.

Subjects :: Molecular dynamics
Materials science
Polymers and Plastics
Chemical physics
Condensed Matter Physics
Ion bombardment
Mechanism (sociology)

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