Dual Grating Interferometric Lithography for 22-nm Node

Dual grating interferometric (DGI) lithography which can be operate in the usage of an incoherent EUV light source is proposed. Thus, the DGI exposure method can combine with a stand alone EUV source, such as laser produced plasma and discharge produced plasma. Therefore, this exposure system becomes a compact one for the evaluation of resolution and LER in a EUV resist.