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22.3: A Novel Barrierless Cu Gate for TFT-LCD

Authors :
Feng‐Yuan Gan
Jer‐Yeong Lai
Han‐Tu Lin
Kou‐Yuan Tu
Wen‐Ching Tsai
Source :
SID Symposium Digest of Technical Papers. 37:1181
Publication Year :
2006
Publisher :
Wiley, 2006.

Abstract

A barrierless Cu gate was proposed to fabricate the TFT-LCD. The wholly Cu-based gate is achieved by applying a Cu-alloy film to improve the poor adhesion of Cu to the glass substrate. The taper angle of Cu/Cu-alloy gate can be easily controlled by using the new Cu etchant. We have developed 1.8” panels with the barrierless Cu gate. Without capping any additional Cu barrier, the TFT characteristics and the reliability of the Cu gate TFT were the same as the one with the conventional metal gate such as Al and its alloys.

Details

ISSN :
0097966X
Volume :
37
Database :
OpenAIRE
Journal :
SID Symposium Digest of Technical Papers
Accession number :
edsair.doi...........4e100d5dd7157c2dad5b00516d1e46a9