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Influence of the Oscillating Electric Field on the Photodetachment of H- near a Metal Surface

Authors :
Shan-shan Wang
Tian-tian Tang
De-hua Wang
Source :
Journal of the Physical Society of Japan. 80:094301
Publication Year :
2011
Publisher :
Physical Society of Japan, 2011.

Abstract

Using the first order classical perturbation theory and the time-dependent closed orbit theory, we study the photodetachment of H - near a metal surface plus a weak oscillating electric field for the first time. The results show that the oscillating electric field can reduce the strength of the photodetachment cross section. The influence of the oscillating electric field is not only related to its strength, but also related to the distance from the ion to the metal surface. For a given ion–surface distance, with the increase of the strength of the oscillating electric field, the oscillating amplitude in the photodetachment cross section was decreased greatly. Besides, for a given oscillating electric field, with the increase of the ion–surface distance, its influence becomes much more obvious. As the ion–surface distance is very large, even a very weak oscillating electric field can weaken the photodetachment cross section of H - near a metal surface greatly. This study provides a new understanding on th...

Details

ISSN :
13474073 and 00319015
Volume :
80
Database :
OpenAIRE
Journal :
Journal of the Physical Society of Japan
Accession number :
edsair.doi...........4a7ebfb7b743933ab32feb2639f3c27d
Full Text :
https://doi.org/10.1143/jpsj.80.094301