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Fabrication of Highly Reliable Watt-Level 660 nm Semiconductor Lasers

Authors :
张新 Zhang Xin
孙素娟 Sun Sujuan
李沛旭 Li Peixu
肖成峰 Xiao Chengfeng
朱振 Zhu Zhen
徐现刚 Xu Xiangang
夏伟 Xia Wei
Source :
Chinese Journal of Lasers. 45:0501002
Publication Year :
2018
Publisher :
Shanghai Institute of Optics and Fine Mechanics, 2018.

Details

ISSN :
02587025
Volume :
45
Database :
OpenAIRE
Journal :
Chinese Journal of Lasers
Accession number :
edsair.doi...........4a12ba5fee221a3466c0479e24c26d04