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Plasma etching of SiO2 contact hole using perfluoropropyl vinyl ether and perfluoroisopropyl vinyl ether

Authors :
Sanghyun You
Jun-Hyun Kim
Chang-Koo Kim
Source :
Korean Journal of Chemical Engineering. 39:63-68
Publication Year :
2022
Publisher :
Springer Science and Business Media LLC, 2022.

Subjects

Subjects :
General Chemical Engineering
General Chemistry

Details

ISSN :
19757220 and 02561115
Volume :
39
Database :
OpenAIRE
Journal :
Korean Journal of Chemical Engineering
Accession number :
edsair.doi...........49fd41831fa37f2659507ce53796834b

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