Experiments in projection lithography using soft x-rays

We have demonstrated soft x-ray projection lithography using radiation at wavelengths of 14 nm and 37 nm with a commercially available 20X reduction Schwarzschild camera. Line widths as small as 0.05 microns have been printed. The resolution obtained was essentially diffraction limited. Iridium coated mirrors were used with 37 nm radiation and Mo/Si multilayer coated mirrors with 14 nm radiation. A 1:1 magnification Offner Ring-field system with iridium coated mirrors has been used with 42 nm radiation. This optic has imaged line widths as small as 0.2 microns, which is close to the diffraction limit for this system. Transmission masks were used for all these experiments and the radiation was obtained from an undulator in the Vacuum Ultraviolet Synchrotron Storage Ring at Brookhaven National Laboratory.