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Quartz Crystal Microbalances for Evaluating Gas Motion Differences between Dichlorosilane and Trichlorosilane in Ambient Hydrogen in a Slim Vertical Cold Wall Chemical Vapor Deposition Reactor
- Source :
- Advances in Chemical Engineering and Science. 10:190-200
- Publication Year :
- 2020
- Publisher :
- Scientific Research Publishing, Inc., 2020.
-
Abstract
- A dichlorosilane gas and a trichlorosilane gas in ambient hydrogen were evaluated to show their different gas flow motions in a slim vertical cold wall chemical vapor deposition reactor for the Minimal Fab system. This evaluation was performed for improving and controlling the film qualities and the productivities, using two quartz crystal microbalances (QCM) installed at the inlet and exhaust of the chamber by taking into account that the QCM frequency corresponds to the real time changes in the gas properties. Typically, the time period approaching from the inlet to the exhaust was shorter for the trichlorosilane gas than that for the dichlorosilane gas. The trichlorosilane gas was shown to move like plug flow, while the dichlorosilane gas seemed to be well mixed in the entire chamber.
- Subjects :
- Materials science
Plug flow
Hydrogen
chemistry.chemical_element
Dichlorosilane
020206 networking & telecommunications
02 engineering and technology
Chemical vapor deposition
Quartz crystal microbalance
021001 nanoscience & nanotechnology
Crystal
chemistry.chemical_compound
chemistry
Chemical engineering
Trichlorosilane
0202 electrical engineering, electronic engineering, information engineering
General Earth and Planetary Sciences
0210 nano-technology
Quartz
General Environmental Science
Subjects
Details
- ISSN :
- 21600406 and 21600392
- Volume :
- 10
- Database :
- OpenAIRE
- Journal :
- Advances in Chemical Engineering and Science
- Accession number :
- edsair.doi...........481cb3ef3c517c82f272e8fd68963366