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Self-stabilizing molecular solution for Cu2SnS3 thin film: An insight into the oxidation inhibitor of bivalent tin ion
- Source :
- Journal of Power Sources. 494:229699
- Publication Year :
- 2021
- Publisher :
- Elsevier BV, 2021.
-
Abstract
- Molecular solution with the metal-thiourea complex is a facile and effective route for Cu2SnS3 (CTS) thin film deposition. However, its stability is still challenging due to flexible metal salts precursors. Here we report a strategy to enhance the stability of the Cu–Sn–S molecular solution that use bivalent Sn to suppress the oxidation of the S2- of thiourea via the redox reaction. The self-stabilizing mechanism has been carefully revealed by the systematic experiments and confirmed by the spontaneous reaction process of metal-thiourea system. It demonstrates that Sn with a low valence state weakens the transfer of lone pair electrons from thiourea to Cu2+ and Sn4+ ions, alleviating the sulfur precipitates from thiourea oxidation because of the easily reducible character of Sn2+ ion. The solution with Sn2+ antioxidant additive can be stored for a long time under air ambient, which is then spin-coated and sulfurized with Sn powder compensation. The uniform CTS thin film with composition control is finally achieved and delivers a device efficiency of 1.15%. This work provides a guide on stabilizing the solution precursor for chalcogenide thin film deposition.
- Subjects :
- Valence (chemistry)
Materials science
Renewable Energy, Sustainability and the Environment
Chalcogenide
Inorganic chemistry
Energy Engineering and Power Technology
chemistry.chemical_element
02 engineering and technology
010402 general chemistry
021001 nanoscience & nanotechnology
01 natural sciences
Redox
0104 chemical sciences
Ion
chemistry.chemical_compound
chemistry
Thiourea
Electrical and Electronic Engineering
Physical and Theoretical Chemistry
Thin film
0210 nano-technology
Tin
Lone pair
Subjects
Details
- ISSN :
- 03787753
- Volume :
- 494
- Database :
- OpenAIRE
- Journal :
- Journal of Power Sources
- Accession number :
- edsair.doi...........4515f46147ce9ad3d6359c24a3c771c5
- Full Text :
- https://doi.org/10.1016/j.jpowsour.2021.229699