Cleaning substrates and subsequent deposition of coatings with coaxial magnetron discharge

The created experimental magnetron sputtering system allows preliminary cleaning of the substrate surface and subsequent deposition of coatings on long cylindrical products within a single system using a coaxial magnetron discharge at a working gas pressure of 150 mTorr. The coating discharge has reverse electrodes polarity relative to the cleaning discharge. A theoretical calculation of the discharge parameters has been carried out.