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Influence of gate and drain bias on the bias-stress stability of flexible organic thin-film transistors
- Source :
- 2014 IEEE 2nd International Conference on Emerging Electronics (ICEE).
- Publication Year :
- 2014
- Publisher :
- IEEE, 2014.
-
Abstract
- In this paper, the influence of gate-source and drain-source bias on the bias-stress stability and lifetime of pentacene-based low-voltage (−3 V) organic thin-film transistors (TFTs) built on plastic substrate has been investigated. The 10%-current-decay lifetime is used for analyzing the influence of applied bias on the bias-stress stability of TFTs, and to compare various biasing conditions. Our results show a 3 to 4 times higher 10%-current-decay lifetime when magnitude of gate-source and drain-source voltage are equal and less than 2.5 V during bias stress, compared to that when drain-source voltage is kept at −3.0 V.
Details
- Database :
- OpenAIRE
- Journal :
- 2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)
- Accession number :
- edsair.doi...........44451f3ab8858c8a7b46709b0147b20a
- Full Text :
- https://doi.org/10.1109/icemelec.2014.7151183