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Influence of gate and drain bias on the bias-stress stability of flexible organic thin-film transistors

Authors :
Hagen Klauk
Ute Zschieschang
Shree Prakash Tiwari
Sibani Bisoyi
Source :
2014 IEEE 2nd International Conference on Emerging Electronics (ICEE).
Publication Year :
2014
Publisher :
IEEE, 2014.

Abstract

In this paper, the influence of gate-source and drain-source bias on the bias-stress stability and lifetime of pentacene-based low-voltage (−3 V) organic thin-film transistors (TFTs) built on plastic substrate has been investigated. The 10%-current-decay lifetime is used for analyzing the influence of applied bias on the bias-stress stability of TFTs, and to compare various biasing conditions. Our results show a 3 to 4 times higher 10%-current-decay lifetime when magnitude of gate-source and drain-source voltage are equal and less than 2.5 V during bias stress, compared to that when drain-source voltage is kept at −3.0 V.

Details

Database :
OpenAIRE
Journal :
2014 IEEE 2nd International Conference on Emerging Electronics (ICEE)
Accession number :
edsair.doi...........44451f3ab8858c8a7b46709b0147b20a