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High‐Resolution Nanopatterning: Recent Progress in Simple and Cost‐Effective Top‐Down Lithography for ≈10 nm Scale Nanopatterns: From Edge Lithography to Secondary Sputtering Lithography (Adv. Mater. 35/2020)

Authors :
Hannes Jung
Hwan-Jin Jeon
Sungwoo Jang
Soo-Yeon Cho
Woo-Bin Jung
Source :
Advanced Materials. 32:2070263
Publication Year :
2020
Publisher :
Wiley, 2020.

Subjects

Subjects :
Materials science
Mechanics of Materials
Sputtering
Mechanical Engineering
High resolution
General Materials Science
Nanotechnology
Edge (geometry)
Lithography

Details

ISSN :
15214095 and 09359648
Volume :
32
Database :
OpenAIRE
Journal :
Advanced Materials
Accession number :
edsair.doi...........43a0c5ef894a9367530da287948ca80e
Full Text :
https://doi.org/10.1002/adma.202070263
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