Identification of Channel Hot Carrier Stress-Induced Oxide Traps Leading to Random Telegraph Signals in pMOSFETs

We investigated the effect of channel hot carrier (CHC) stressing on the creation of gate oxide defect centers causing random telegraph signals (RTSs) in pMOSFETs. To identify these stress-induced hole traps in the oxide and fully characterize their trapping properties, variable temperature RTS measurements were performed from room temperature down to 215 K and repeated after each stressing interval, up to 1200 s. The trapping properties of the stress-induced defect sites and those present before stress are quantified, including the hole capture and emission activation energies, structural relaxation in the oxide network due to trapping/detrapping, and entropy change as well as the energy level and position of the trap in the oxide. Based on this information, disassociated III-Si and hydrogen bridge defects are identified as the hole trapping centers in SiO2. Difference was observed between the process- and stress-induced traps in the entropy change upon hole emission from the oxide trap to Si channel (electron capture from the Si valence band), implying the possibility of stress-induced structural defects being different than the native ones.