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Spatially resolved thickness analysis of microscale structures using micro-Raman spectroscopy

Authors :
Litian Liu
Jianyuan Yu
Tian-Ling Ren
Xiaoming Wu
Source :
Applied Physics Letters. 89:211903
Publication Year :
2006
Publisher :
AIP Publishing, 2006.

Abstract

A novel method, by using micro-Raman spectroscopy, is developed to measure the thickness of microelectromechanical system structures with high spatial resolution. When a microscale structure is heated by a laser, the temperature rise of the structure depends on the structure thickness and material properties. Therefore, the structure thickness can be measured using Raman shift, which is a function of temperature. Micro-Raman spectrometer is capable of measuring the thickness distribution of microscale structures with micron spatial resolution. This technique is evaluated by characterizing the thickness distribution of a single-crystal silicon (c-Si) membrane. The measured thickness distributions are verified by scanning electron microscope measurement.

Details

ISSN :
10773118 and 00036951
Volume :
89
Database :
OpenAIRE
Journal :
Applied Physics Letters
Accession number :
edsair.doi...........41c80b1d4f83be5179b108a65f44c466