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Surface Imaging for EB-Nanolithography

Authors :
W. Höppner
L. Bauch
M. Böttcher
A. Wolff
Source :
NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies ISBN: 9789048143887
Publication Year :
1994
Publisher :
Springer Netherlands, 1994.

Abstract

A combination of Surface Imaging resist with a Low Voltage EBL is suggested and it is referred to a suitable EBL-equipment

Details

ISBN :
978-90-481-4388-7
ISBNs :
9789048143887
Database :
OpenAIRE
Journal :
NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies ISBN: 9789048143887
Accession number :
edsair.doi...........4060e6f8eca86ce18700198b5e405bd4
Full Text :
https://doi.org/10.1007/978-94-015-8261-2_6