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Surface Imaging for EB-Nanolithography
- Source :
- NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies ISBN: 9789048143887
- Publication Year :
- 1994
- Publisher :
- Springer Netherlands, 1994.
-
Abstract
- A combination of Surface Imaging resist with a Low Voltage EBL is suggested and it is referred to a suitable EBL-equipment
Details
- ISBN :
- 978-90-481-4388-7
- ISBNs :
- 9789048143887
- Database :
- OpenAIRE
- Journal :
- NANOLITHOGRAPHY: A Borderland between STM, EB, IB, and X-Ray Lithographies ISBN: 9789048143887
- Accession number :
- edsair.doi...........4060e6f8eca86ce18700198b5e405bd4
- Full Text :
- https://doi.org/10.1007/978-94-015-8261-2_6