Back to Search Start Over

Thermal Analysis of Degradation in Ga2O3–In2O3–ZnO Thin-Film Transistors

Authors :
Ji Sim Jung
Tomoaki Hatayama
Yukiharu Uraoka
Takashi Fuyuki
Jang Yeon Kwon
Hiroshi Yano
Mami N. Fujii
Source :
Japanese Journal of Applied Physics. 47:6236-6240
Publication Year :
2008
Publisher :
IOP Publishing, 2008.

Abstract

Degradation of Ga2O3–In2O3–ZnO (GIZO) thin-film transistors (TFTs), which are promising for driving circuits of next-generation displays, was studied. We found a degradation mode that was not observed in silicon TFTs. A parallel shift without any change of the transfer curve was observed under gate voltage stress. Judging from the bias voltage dependences we confirmed that the mode was mainly dominated by a vertical electric field. Thermal distribution was measured to analysis the degradation mechanism. Joule heating caused by drain current was observed; however, a marked acceleration of degradation by drain bias was not found. Therefore, we concluded that Joule heating did not accelerate degradation. Recovery of electrical properties independent of stress voltage were observed.

Details

ISSN :
13474065 and 00214922
Volume :
47
Database :
OpenAIRE
Journal :
Japanese Journal of Applied Physics
Accession number :
edsair.doi...........40108aed1a97ee807a798a686eb89ae5
Full Text :
https://doi.org/10.1143/jjap.47.6236