Back to Search
Start Over
Thermal Analysis of Degradation in Ga2O3–In2O3–ZnO Thin-Film Transistors
- Source :
- Japanese Journal of Applied Physics. 47:6236-6240
- Publication Year :
- 2008
- Publisher :
- IOP Publishing, 2008.
-
Abstract
- Degradation of Ga2O3–In2O3–ZnO (GIZO) thin-film transistors (TFTs), which are promising for driving circuits of next-generation displays, was studied. We found a degradation mode that was not observed in silicon TFTs. A parallel shift without any change of the transfer curve was observed under gate voltage stress. Judging from the bias voltage dependences we confirmed that the mode was mainly dominated by a vertical electric field. Thermal distribution was measured to analysis the degradation mechanism. Joule heating caused by drain current was observed; however, a marked acceleration of degradation by drain bias was not found. Therefore, we concluded that Joule heating did not accelerate degradation. Recovery of electrical properties independent of stress voltage were observed.
- Subjects :
- Materials science
Physics and Astronomy (miscellaneous)
Silicon
business.industry
Transistor
General Engineering
General Physics and Astronomy
chemistry.chemical_element
Biasing
law.invention
chemistry
Thin-film transistor
law
Electric field
Optoelectronics
Degradation (geology)
business
Joule heating
Voltage
Subjects
Details
- ISSN :
- 13474065 and 00214922
- Volume :
- 47
- Database :
- OpenAIRE
- Journal :
- Japanese Journal of Applied Physics
- Accession number :
- edsair.doi...........40108aed1a97ee807a798a686eb89ae5
- Full Text :
- https://doi.org/10.1143/jjap.47.6236