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A note on extending the alias length pattern
- Source :
- Statistics & Probability Letters. 138:82-89
- Publication Year :
- 2018
- Publisher :
- Elsevier BV, 2018.
-
Abstract
- The alias length pattern (ALP) was proposed to characterize the aliasing among two-factor interactions for regular two-level fractional factorial designs of resolution I V . Experimenters often pay more attention to joint estimation of main effects and some two-factor interactions. Hence, resolution I I I and I V designs are commonly used in practice. In this article, we first extend the ALP for regular two-level fractional factorial designs of resolution I I I and I V by modeling justification. Then we study the properties of the ALP and provide the relationships between the ALP and other popular criteria.
- Subjects :
- Statistics and Probability
Alias
Resolution (electron density)
Fractional factorial design
020206 networking & telecommunications
02 engineering and technology
01 natural sciences
010104 statistics & probability
0202 electrical engineering, electronic engineering, information engineering
0101 mathematics
Statistics, Probability and Uncertainty
Aliasing (computing)
Joint (audio engineering)
Algorithm
Mathematics
Subjects
Details
- ISSN :
- 01677152
- Volume :
- 138
- Database :
- OpenAIRE
- Journal :
- Statistics & Probability Letters
- Accession number :
- edsair.doi...........3f5e23165f68834436b58930fbd3e4c3
- Full Text :
- https://doi.org/10.1016/j.spl.2018.02.060