Preparation of Perovskite Structure K(Ta0.65Nb0.35)O3 Films by Pulsed Laser Deposition on Si Substrates

Highly oriented and perovskite structure KTN (potassium tantalate-niobate) thin films were fabricated by pulsed laser deposition technique on Si(100) substrates. The surface of the thin films is homogeneous, crack-free and dense. The ferroelectric measurement was carried out on metal-ferroelectric-metal capacitors and the remanent polarization and the coercive field were 8.66 μC/cm 2 and 7.44 kV/cm, respectively. The effects of the substrate temperature, laser energy density on the target and oxygen pressure during the deposition process on the structure of thin films were discussed.