Multifold study of volume plasma chemistry in Ar/CF4and Ar/CHF3CCP discharges

Authors :: S M Zyryanov
Tatyana Rakhimova
Dmitry Lopaev
Olga Proshina
A I Zotovich
A. T. Rakhimov
Source :: Plasma Sources Science and Technology. 26:075005
Publication Year :: 2017
Publisher :: IOP Publishing, 2017.

Subjects :: 010302 applied physics
Materials science
Volume (thermodynamics)
0103 physical sciences
Plasma chemistry
Analytical chemistry
Condensed Matter Physics
01 natural sciences
010305 fluids & plasmas

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