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Negative-Working E-Beam Copolymers

Authors :
Michael J. Hanrahan
Robert C. Daly
Richard W. Blevins
Source :
SPIE Proceedings.
Publication Year :
1985
Publisher :
SPIE, 1985.

Abstract

Copolymers of allyl methacrylate and propargyl methacrylate have very high speed as electron-beam and x-ray resists. They produce polymers of a structural complexity not often encountered in addition polymerization. The structural variety available in allyl methacrylate polymers gives them unusual properties, which consequently enhance their microlithographic performance.

Details

ISSN :
0277786X
Database :
OpenAIRE
Journal :
SPIE Proceedings
Accession number :
edsair.doi...........3c8a66c1640aa0da103634b08f44cfea