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Bulk single crystals and physical properties of β-(AlxGa1−x)2O3 (x = 0–0.35) grown by the Czochralski method

Authors :
Zbigniew Galazka
Andreas Fiedler
Andreas Popp
Steffen Ganschow
Albert Kwasniewski
Palvan Seyidov
Mike Pietsch
Andrea Dittmar
Saud Bin Anooz
Klaus Irmscher
Manuela Suendermann
Detlef Klimm
Ta-Shun Chou
Jana Rehm
Thomas Schroeder
Matthias Bickermann
Source :
Journal of Applied Physics. 133:035702
Publication Year :
2023
Publisher :
AIP Publishing, 2023.

Abstract

We have systematically studied the growth, by the Czochralski method, and basic physical properties of a 2 cm and 2 in. diameter bulk β-(AlxGa1−x)2O3 single crystal with [Al] = 0–35 mol. % in the melt in 5 mol. % steps. The segregation coefficient of Al in the Ga2O3 melt of 1.1–1.2 results in a higher Al content in the crystals than in the melt. The crystals were also co-doped with Si or Mg. [Al] = 30 mol. % in the melt (33–36 mol. % in the crystals) seems to be a limit for obtaining bulk single crystals of high structural quality suitable for homoepitaxy. The crystals were either semiconducting (no intentional co-dopants with [Al] = 0–30 mol. % and Si-doped with [Al] = 15–20 mol. %), degenerately semiconducting (Si-doped with [Al] ≤ 15 mol. %), or semi-insulating ([Al] ≥ 25 mol. % and/or Mg-doped). The full width at half maximum of the rocking curve was 30–50 arcsec. The crystals showed a linear but anisotropic decrease in all lattice constants and a linear increase in the optical bandgap (5.6 eV for [Al] = 30 mol. %). The room temperature electron mobility at similar free electron concentrations gradually decreases with [Al], presumably due to enhanced scattering at phonons as the result of a larger lattice distortion. In Si co-doped crystals, the scattering is enhanced by ionized impurities. Measured electron mobilities and bandgaps enabled to estimate the Baliga figure of merit for electronic devices.

Subjects

Subjects :
General Physics and Astronomy

Details

ISSN :
10897550 and 00218979
Volume :
133
Database :
OpenAIRE
Journal :
Journal of Applied Physics
Accession number :
edsair.doi...........3c1f9c68c2beaf49705f995a7d5460c2
Full Text :
https://doi.org/10.1063/5.0131285