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Epitaxial silicon avalanche photodiode
- Source :
- Opto-electronics. 6:153-160
- Publication Year :
- 1974
- Publisher :
- Springer Science and Business Media LLC, 1974.
-
Abstract
- Preparation of silicon avalanche photodiodes by a planar method in epitaxial PP+ silicon slices limited charge collection to carriers generated in or close to the depletion region. Reducing the effective size of the zero-field absorption region surrounding the depletion region by this method, resulted in the output signal current of the device reproducing the input light pulse shape, within 15 ns. When illuminated with monochromatic radiation, the shot noise of a detector prepared in epitaxial material was less than that observed with a device fabricated in homogeneous material, due to the reduced signal current.
- Subjects :
- Materials science
Silicon
Physics::Instrumentation and Detectors
business.industry
Detector
Shot noise
chemistry.chemical_element
Epitaxy
Avalanche photodiode
Signal
Atomic and Molecular Physics, and Optics
Electronic, Optical and Magnetic Materials
Optics
Depletion region
chemistry
Optoelectronics
Electrical and Electronic Engineering
Absorption (electromagnetic radiation)
business
Subjects
Details
- ISSN :
- 1572817X and 03068919
- Volume :
- 6
- Database :
- OpenAIRE
- Journal :
- Opto-electronics
- Accession number :
- edsair.doi...........3ab41d6df074031a7f6fd83114ce5e2c
- Full Text :
- https://doi.org/10.1007/bf01419063