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Self-aligned single-exposure deep x-ray lithography

Authors :
M. Boerner
V.P. Nazmov
E.F. Reznikova
B.G. Goldenberg
Source :
SYNCHROTRON AND FREE ELECTRON LASER RADIATION: Generation and Application (SFR-2020).
Publication Year :
2020
Publisher :
AIP Publishing, 2020.

Abstract

The method of deep X-ray lithography has been developed, which allows the formation of self-aligned microstructures. Examples of microstructures are presented.

Subjects

Subjects :
Materials science
Single exposure
business.industry
Optoelectronics
X-ray lithography
business
Lithography

Details

ISSN :
0094243X
Database :
OpenAIRE
Journal :
SYNCHROTRON AND FREE ELECTRON LASER RADIATION: Generation and Application (SFR-2020)
Accession number :
edsair.doi...........3ab05daf135bfa496d3dc3df3fd3ac6a
Full Text :
https://doi.org/10.1063/5.0030469
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