Characteristics of High‐Crystallinity ZrO 2 Thin Films Deposited Using Remote Plasma Atomic Layer Deposition

Subjects

Subjects :

Materials Chemistry
Surfaces and Interfaces
Electrical and Electronic Engineering
Condensed Matter Physics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials

Details

ISSN :

18626319 and 18626300

Volume :

220

Database :

OpenAIRE

Journal :

physica status solidi (a)

Accession number :

edsair.doi...........3a24e3a0b75ca5172c18973e1c334b73