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High performance ZnO nanowire field effect transistor

Authors :
Mark E. Welland
Ghim Wei Ho
S.N. Cha
Dae Joon Kang
David G. Hasko
Youngjin Choi
Jae Eun Jang
Gehan A. J. Amaratunga
Source :
Proceedings of 35th European Solid-State Device Research Conference, 2005. ESSDERC 2005..
Publication Year :
2005
Publisher :
IEEE, 2005.

Abstract

A zinc oxide (ZnO) nanowire field effect transistor having the highest mobility and lowest subthreshold slope obtained to date (from ZnO) is reported. The device consists of a single nanowire with self-aligned gate electrodes having well defined nanoscale spacing, independent of lithographic definition. The fabricated device exhibits a transconductance of 3.06 /spl mu/S, a mobility of 450 cm/sup 2//Vs and a subthreshold swing of 129 mV/decade. The transistor also shows an on/off current ratio of 10/sup 6/.

Details

Database :
OpenAIRE
Journal :
Proceedings of 35th European Solid-State Device Research Conference, 2005. ESSDERC 2005.
Accession number :
edsair.doi...........39bcd2cc1541eba305c00992c326797f