Role of Precursor Choice on Area-Selective Atomic Layer Deposition

Authors :: Stacey F. Bent
Il Kwon Oh
Nathaniel E. Richey
Tania E. Sandoval
Tzu-Ling Liu
Source :: Chemistry of Materials. 33:3926-3935
Publication Year :: 2021
Publisher :: American Chemical Society (ACS), 2021.

Subjects :: Atomic layer deposition
Materials science
Chemical engineering
General Chemical Engineering
Materials Chemistry
General Chemistry

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