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Smart scaling technology for advanced FinFET node
- Source :
- 2018 IEEE Symposium on VLSI Technology.
- Publication Year :
- 2018
- Publisher :
- IEEE, 2018.
-
Abstract
- Because of the complexity of technology the level of engagement between technology and design has been increased more than ever before. Design technology co-optimization (DTCO) is used to describe the process of making with competitive power, performance, area, and yield (PPAY) in various applications. This paper describes smart scaling technologies for advanced FinFET node to make technology more competitive.
Details
- Database :
- OpenAIRE
- Journal :
- 2018 IEEE Symposium on VLSI Technology
- Accession number :
- edsair.doi...........38c15dc4eaa8fed4f5b78ebdfc33f40c
- Full Text :
- https://doi.org/10.1109/vlsit.2018.8510675