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Smart scaling technology for advanced FinFET node

Authors :
Lim Jin-Young
Jongwook Kye
Lee Seung-Young
Taejoong Song
Hoonki Kim
Jong-Hoon Jung
Source :
2018 IEEE Symposium on VLSI Technology.
Publication Year :
2018
Publisher :
IEEE, 2018.

Abstract

Because of the complexity of technology the level of engagement between technology and design has been increased more than ever before. Design technology co-optimization (DTCO) is used to describe the process of making with competitive power, performance, area, and yield (PPAY) in various applications. This paper describes smart scaling technologies for advanced FinFET node to make technology more competitive.

Details

Database :
OpenAIRE
Journal :
2018 IEEE Symposium on VLSI Technology
Accession number :
edsair.doi...........38c15dc4eaa8fed4f5b78ebdfc33f40c
Full Text :
https://doi.org/10.1109/vlsit.2018.8510675