Fabrication of Silicon-based Micro Pore Array with Large-area and High Aspect-ratio by Photo-electrochemical Etching

MLA

郭金川 Guo Jin-chuan, et al. “Fabrication of Silicon-Based Micro Pore Array with Large-Area and High Aspect-Ratio by Photo-Electrochemical Etching.” ACTA PHOTONICA SINICA, vol. 41, Jan. 2012, pp. 228–31. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........3850b002e86492f3b6a398302436c1f0&authtype=sso&custid=ns315887.

APA

郭金川 Guo Jin-chuan, 周彬 Zhou Bin, 罗建东 Luo Jian-dong, & 吕文峰 Lü Wenfeng. (2012). Fabrication of Silicon-based Micro Pore Array with Large-area and High Aspect-ratio by Photo-electrochemical Etching. ACTA PHOTONICA SINICA, 41, 228–231.

Chicago

郭金川 Guo Jin-chuan, 周彬 Zhou Bin, 罗建东 Luo Jian-dong, and 吕文峰 Lü Wenfeng. 2012. “Fabrication of Silicon-Based Micro Pore Array with Large-Area and High Aspect-Ratio by Photo-Electrochemical Etching.” ACTA PHOTONICA SINICA 41 (January): 228–31. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi...........3850b002e86492f3b6a398302436c1f0&authtype=sso&custid=ns315887.