Imaging and Patterning on Nanometer Scale Using Coherent EUV Light

Extreme ultraviolet (EUV) covers wavelength range from about 5 nm to 50 nm. That is why EUV isespeciallyapplicableforimagingandpatterningonnanometerscalelength. Inthepaperperiodicnanopatterningrealized by interference lithography and high resolution holographic nanoimaging performed in a Gabor in-lineschemearepresented. IntheexperimentsacompacttabletopEUVlaserwasused. PreliminarystudiesonusingalaserplasmaEUVsourcefornanoimagingarepresentedaswell.PACSnumbers:42.25.Hz,42.40.Ht,42.40.