Back to Search
Start Over
Extracting Radio Frequency Properties of a Typical Through-Silicon Via Structure With a Self-Developed Deembedding Technique
- Source :
- IEEE Transactions on Components, Packaging and Manufacturing Technology. 9:921-926
- Publication Year :
- 2019
- Publisher :
- Institute of Electrical and Electronics Engineers (IEEE), 2019.
-
Abstract
- The parasitic effect inside through-silicon via (TSV) packaging under radio frequency (RF) operation may cause abnormal signals in circuit performance. On the bases of a self-developed deembedding technique, we investigated the high-frequency characteristics of a typical TSV structure through direct measurements. To this end, a silicon substrate layout was first designed and constructed, followed by packaging mounting to build a suitable setting for RF measurements. Behaviors up to 3 GHz on different circuit segments in an actual TSV packaging were then measured directly by using an RF-inductance, capacitance, and resistance (LCR) meter, and R, L, and impedance (Z) data for test structures were then extracted and compared with those reported in the literature. To study the environmental effect on the RF properties of the TSV test samples, we monitored behaviors during a temperature-humidity reliability test.
- Subjects :
- Materials science
Through-silicon via
Silicon
Circuit performance
business.industry
chemistry.chemical_element
020206 networking & telecommunications
02 engineering and technology
Substrate (electronics)
Capacitance
Industrial and Manufacturing Engineering
Electronic, Optical and Magnetic Materials
Reliability (semiconductor)
chemistry
0202 electrical engineering, electronic engineering, information engineering
Optoelectronics
Radio frequency
Electrical and Electronic Engineering
business
Electrical impedance
Subjects
Details
- ISSN :
- 21563985 and 21563950
- Volume :
- 9
- Database :
- OpenAIRE
- Journal :
- IEEE Transactions on Components, Packaging and Manufacturing Technology
- Accession number :
- edsair.doi...........36d4dc501e7d750d4ac779f969826a19
- Full Text :
- https://doi.org/10.1109/tcpmt.2018.2890009