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Highly Stacked 8 $\mathbf{Ge}_{\boldsymbol{0.9}}\mathbf{Sn}_{\boldsymbol{0.1}}$ Nanosheet pFETs with Ultrathin Bodies (~3nm) and Thick Bodies (~30nm) Featuring the Respective Record $\mathbf{I}_{\mathbf{ON}}/\mathbf{I}_{\mathbf{OFF}}$ of 1.4x107 and Record $\mathbf{I}_{\mathbf{ON}}$ of $\boldsymbol{92}\boldsymbol{\mu}\mathbf{A}$ at $\mathbf{V}_{\mathbf{ov}}=\mathbf{V}_{\mathbf{DS}}=$ -0.5V by CVD Epitaxy and Dry Etching

Authors :
Chung-En Tsai
Yi-Chun Liu
Chien-Te Tu
Bo-Wei Huang
Sun-Rong Jan
Yu-Rui Chen
Jyun-Yan Chen
Shee-Jier Chueh
Chun-Yi Cheng
Chia-Jung Tsen
Yichen Ma
C. W. Liu
Source :
2021 IEEE International Electron Devices Meeting (IEDM).
Publication Year :
2021
Publisher :
IEEE, 2021.

Details

Database :
OpenAIRE
Journal :
2021 IEEE International Electron Devices Meeting (IEDM)
Accession number :
edsair.doi...........35c31203f6cba2076d95a07504ef6828